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Alloyed High-k-Based Resistive Switching Memory in Contact Hole Structuresopen access

Authors
Kim, ByeongjeongMahata, ChandreswarRyu, HojeongIsmail, MuhammadYang, Byung-DoKim, Sungjun
Issue Date
Apr-2021
Publisher
MDPI
Keywords
neuromorphic; resistive memory; resistive switching; alloying
Citation
COATINGS, v.11, no.4
Indexed
SCIE
SCOPUS
Journal Title
COATINGS
Volume
11
Number
4
URI
https://scholarworks.dongguk.edu/handle/sw.dongguk/17895
DOI
10.3390/coatings11040451
ISSN
2079-6412
2079-6412
Abstract
Resistive random-access memory (RRAM) devices are noticeable next generation memory devices. However, only few studies have been conducted regarding RRAM devices made of alloy. In this paper, we investigate the resistive switching behaviors of an Au/Ti/HfTiOx/p-Si memory device. The bipolar switching is characterized depending on compliance current under DC sweep mode. Good retention in the low-resistance state and high-resistance state is attained for nonvolatile memory and long-term memory in a synapse device. For practical switching operation, the pulse transient characteristics are studied for set and reset processes. Moreover, a synaptic weight change is achieved by a moderate pulse input for the potentiation and depression characteristics of the synaptic device. We reveal that the high-resistance state and low-resistance state are dominated by Schottky emissions.
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