Cited 5 time in
Alloyed High-k-Based Resistive Switching Memory in Contact Hole Structures
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Byeongjeong | - |
| dc.contributor.author | Mahata, Chandreswar | - |
| dc.contributor.author | Ryu, Hojeong | - |
| dc.contributor.author | Ismail, Muhammad | - |
| dc.contributor.author | Yang, Byung-Do | - |
| dc.contributor.author | Kim, Sungjun | - |
| dc.date.accessioned | 2024-08-08T04:31:03Z | - |
| dc.date.available | 2024-08-08T04:31:03Z | - |
| dc.date.issued | 2021-04 | - |
| dc.identifier.issn | 2079-6412 | - |
| dc.identifier.issn | 2079-6412 | - |
| dc.identifier.uri | https://scholarworks.dongguk.edu/handle/sw.dongguk/17895 | - |
| dc.description.abstract | Resistive random-access memory (RRAM) devices are noticeable next generation memory devices. However, only few studies have been conducted regarding RRAM devices made of alloy. In this paper, we investigate the resistive switching behaviors of an Au/Ti/HfTiOx/p-Si memory device. The bipolar switching is characterized depending on compliance current under DC sweep mode. Good retention in the low-resistance state and high-resistance state is attained for nonvolatile memory and long-term memory in a synapse device. For practical switching operation, the pulse transient characteristics are studied for set and reset processes. Moreover, a synaptic weight change is achieved by a moderate pulse input for the potentiation and depression characteristics of the synaptic device. We reveal that the high-resistance state and low-resistance state are dominated by Schottky emissions. | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | MDPI | - |
| dc.title | Alloyed High-k-Based Resistive Switching Memory in Contact Hole Structures | - |
| dc.type | Article | - |
| dc.publisher.location | 스위스 | - |
| dc.identifier.doi | 10.3390/coatings11040451 | - |
| dc.identifier.scopusid | 2-s2.0-85123374145 | - |
| dc.identifier.wosid | 000642926300001 | - |
| dc.identifier.bibliographicCitation | COATINGS, v.11, no.4 | - |
| dc.citation.title | COATINGS | - |
| dc.citation.volume | 11 | - |
| dc.citation.number | 4 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | Y | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.subject.keywordAuthor | neuromorphic | - |
| dc.subject.keywordAuthor | resistive memory | - |
| dc.subject.keywordAuthor | resistive switching | - |
| dc.subject.keywordAuthor | alloying | - |
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