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NH3 분위기 후열처리에 따른 SiC 기판 위에 성장된 HfO2 박막의 계면 변화 연구
- Authors
- 정권범
- Issue Date
- 17-Feb-2016
- Place
- 대한민국
- Conference Name
- 한국진공학회
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Collections - College of Natural Science > Department of Physics > 2. Conference Papers
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Related Researcher
- Chung, Kwun Bum
- College of Natural Science (Department of Physics)