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Sequential annealing effects of HfSiON gate dielectric films on n-type Ge substrate
- Authors
- 정권범
- Issue Date
- 19-Oct-2016
- Place
- 대한민국
- Conference Name
- 한국물리학회
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Collections - College of Natural Science > Department of Physics > 2. Conference Papers
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Related Researcher
- Chung, Kwun Bum
- College of Natural Science (Department of Physics)