Nonlinear Characteristics of Complementary Resistive Switching in HfAlOx-Based Memristor for High-Density Cross-Point Array Structureopen access
- Authors
- Choi, Junhyeok; Kim, Sungjun
- Issue Date
- Aug-2020
- Publisher
- MDPI
- Keywords
- HfAlOx-based memristor; complementary resistive switching; microstructures; nonlinearity
- Citation
- COATINGS, v.10, no.8
- Indexed
- SCIE
SCOPUS
- Journal Title
- COATINGS
- Volume
- 10
- Number
- 8
- URI
- https://scholarworks.dongguk.edu/handle/sw.dongguk/6388
- DOI
- 10.3390/coatings10080765
- ISSN
- 2079-6412
2079-6412
- Abstract
- In this work, we present the nonlinear current-voltage (I-V) characteristics of a complementary resistive switching (CRS)-like curve from a HfAlOx-based memristor, used to implement a high-density cross-point array. A Pt/HfAlOx/TiN device has lower on-current and larger selectivity compared to Pt/HfO2/TiN or Pt/Al2O3/TiN devices. It has been shown that the on-current and first reset peak current after the forming process are crucial in obtaining a CRS-like curve. We demonstrate transient CRS-like characteristics with high nonlinearity under pulse response for practical applications. Finally, after finding the optimal conditions for high selectivity, the calculated read margin proves that a Pt/HfAlOx/TiN device with a CRS-like curve is most suitable for use in a high-density cross-point array. Our results suggest that the built-in selector properties in a Pt/HfAlOx/TiN single layer device offer considerable potential in terms of the simplicity of the processes involved in the cross-point structure.
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Collections - College of Engineering > Department of Electronics and Electrical Engineering > 1. Journal Articles

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