Cited 18 time in
Nonlinear Characteristics of Complementary Resistive Switching in HfAlOx-Based Memristor for High-Density Cross-Point Array Structure
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Choi, Junhyeok | - |
| dc.contributor.author | Kim, Sungjun | - |
| dc.date.accessioned | 2023-04-27T22:40:40Z | - |
| dc.date.available | 2023-04-27T22:40:40Z | - |
| dc.date.issued | 2020-08 | - |
| dc.identifier.issn | 2079-6412 | - |
| dc.identifier.issn | 2079-6412 | - |
| dc.identifier.uri | https://scholarworks.dongguk.edu/handle/sw.dongguk/6388 | - |
| dc.description.abstract | In this work, we present the nonlinear current-voltage (I-V) characteristics of a complementary resistive switching (CRS)-like curve from a HfAlOx-based memristor, used to implement a high-density cross-point array. A Pt/HfAlOx/TiN device has lower on-current and larger selectivity compared to Pt/HfO2/TiN or Pt/Al2O3/TiN devices. It has been shown that the on-current and first reset peak current after the forming process are crucial in obtaining a CRS-like curve. We demonstrate transient CRS-like characteristics with high nonlinearity under pulse response for practical applications. Finally, after finding the optimal conditions for high selectivity, the calculated read margin proves that a Pt/HfAlOx/TiN device with a CRS-like curve is most suitable for use in a high-density cross-point array. Our results suggest that the built-in selector properties in a Pt/HfAlOx/TiN single layer device offer considerable potential in terms of the simplicity of the processes involved in the cross-point structure. | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | MDPI | - |
| dc.title | Nonlinear Characteristics of Complementary Resistive Switching in HfAlOx-Based Memristor for High-Density Cross-Point Array Structure | - |
| dc.type | Article | - |
| dc.publisher.location | 스위스 | - |
| dc.identifier.doi | 10.3390/coatings10080765 | - |
| dc.identifier.scopusid | 2-s2.0-85089773030 | - |
| dc.identifier.wosid | 000564693700001 | - |
| dc.identifier.bibliographicCitation | COATINGS, v.10, no.8 | - |
| dc.citation.title | COATINGS | - |
| dc.citation.volume | 10 | - |
| dc.citation.number | 8 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | Y | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.subject.keywordPlus | MEMORY | - |
| dc.subject.keywordPlus | IMPLEMENTATION | - |
| dc.subject.keywordPlus | MECHANISMS | - |
| dc.subject.keywordPlus | BEHAVIOR | - |
| dc.subject.keywordAuthor | HfAlOx-based memristor | - |
| dc.subject.keywordAuthor | complementary resistive switching | - |
| dc.subject.keywordAuthor | microstructures | - |
| dc.subject.keywordAuthor | nonlinearity | - |
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