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Metal oxide semiconductor-based negative capacitance field-effect transistors with a sub-threshold swing of below 30 mV/decopen access

Authors
Min, Ji HyeonJang, Seong CheolKim, Kyong JaeRim, You SeungKim, Hyun-Suk
Issue Date
Dec-2025
Publisher
Elsevier Ltd
Keywords
Ferroelectric Hzo; Igzo; Low-power Electronics; Negative Capacitance; Oxide Semiconductor; Subthreshold Swing; Aluminum Oxide; Capacitance; Data Handling; Ferroelectric Devices; Ferroelectric Materials; Ferroelectricity; Fluorine Compounds; Gate Dielectrics; Hafnium Compounds; High-k Dielectric; Low Power Electronics; Mos Devices; Transistors; Zirconium Compounds; Ferroelectric Hzo; Field-effect Transistor; High- K; Igzo; Low-power Electronics; Metal Oxide Semiconductor; Negative Capacitance; Processing Power; Sub-threshold Swing(ss); Subthreshold; Oxide Semiconductors
Citation
Materials Today Electronics, v.14, pp 1 - 8
Pages
8
Indexed
SCOPUS
ESCI
Journal Title
Materials Today Electronics
Volume
14
Start Page
1
End Page
8
URI
https://scholarworks.dongguk.edu/handle/sw.dongguk/61725
DOI
10.1016/j.mtelec.2025.100178
ISSN
2772-9494
2772-9494
Abstract
Effective data processing and low power consumption of electronic devices have been demanded for artificial intelligence technologies. Here, we report IGZO-based negative capacitance field-effect transistors (IGZO NC-FETs) with stacked gate dielectrics composed of ferroelectric Hf<inf>0.5</inf>Zr<inf>0.5</inf>O<inf>2</inf> and high-k Al<inf>2</inf>O<inf>3.</inf> The manifestation of negative capacitance behavior was confirmed by the suppression of the thermionic subthreshold swing limit resulted in the improvement of low-power switching performance. The IGZO NC-FET occurs below 30 mV/dec of a steep subthreshold swing (SS), exceptionally across a gate bias range of ±1 V. Furthermore, high-k Al<inf>2</inf>O<inf>3</inf> as a stabilizing layer suppresses the hysteresis, effectively coupled with a conventional ferroelectric layer. © 2025 Elsevier B.V., All rights reserved.
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