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Metal oxide semiconductor-based negative capacitance field-effect transistors with a sub-threshold swing of below 30 mV/dec

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dc.contributor.authorMin, Ji Hyeon-
dc.contributor.authorJang, Seong Cheol-
dc.contributor.authorKim, Kyong Jae-
dc.contributor.authorRim, You Seung-
dc.contributor.authorKim, Hyun-Suk-
dc.date.accessioned2025-10-15T02:00:09Z-
dc.date.available2025-10-15T02:00:09Z-
dc.date.issued2025-12-
dc.identifier.issn2772-9494-
dc.identifier.issn2772-9494-
dc.identifier.urihttps://scholarworks.dongguk.edu/handle/sw.dongguk/61725-
dc.description.abstractEffective data processing and low power consumption of electronic devices have been demanded for artificial intelligence technologies. Here, we report IGZO-based negative capacitance field-effect transistors (IGZO NC-FETs) with stacked gate dielectrics composed of ferroelectric Hf<inf>0.5</inf>Zr<inf>0.5</inf>O<inf>2</inf> and high-k Al<inf>2</inf>O<inf>3.</inf> The manifestation of negative capacitance behavior was confirmed by the suppression of the thermionic subthreshold swing limit resulted in the improvement of low-power switching performance. The IGZO NC-FET occurs below 30 mV/dec of a steep subthreshold swing (SS), exceptionally across a gate bias range of ±1 V. Furthermore, high-k Al<inf>2</inf>O<inf>3</inf> as a stabilizing layer suppresses the hysteresis, effectively coupled with a conventional ferroelectric layer. © 2025 Elsevier B.V., All rights reserved.-
dc.format.extent8-
dc.language영어-
dc.language.isoENG-
dc.publisherElsevier Ltd-
dc.titleMetal oxide semiconductor-based negative capacitance field-effect transistors with a sub-threshold swing of below 30 mV/dec-
dc.typeArticle-
dc.publisher.location네델란드-
dc.identifier.doi10.1016/j.mtelec.2025.100178-
dc.identifier.scopusid2-s2.0-105017233469-
dc.identifier.wosid001588410200001-
dc.identifier.bibliographicCitationMaterials Today Electronics, v.14, pp 1 - 8-
dc.citation.titleMaterials Today Electronics-
dc.citation.volume14-
dc.citation.startPage1-
dc.citation.endPage8-
dc.type.docTypeArticle-
dc.description.isOpenAccessY-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClassesci-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordAuthorFerroelectric Hzo-
dc.subject.keywordAuthorIgzo-
dc.subject.keywordAuthorLow-power Electronics-
dc.subject.keywordAuthorNegative Capacitance-
dc.subject.keywordAuthorOxide Semiconductor-
dc.subject.keywordAuthorSubthreshold Swing-
dc.subject.keywordAuthorAluminum Oxide-
dc.subject.keywordAuthorCapacitance-
dc.subject.keywordAuthorData Handling-
dc.subject.keywordAuthorFerroelectric Devices-
dc.subject.keywordAuthorFerroelectric Materials-
dc.subject.keywordAuthorFerroelectricity-
dc.subject.keywordAuthorFluorine Compounds-
dc.subject.keywordAuthorGate Dielectrics-
dc.subject.keywordAuthorHafnium Compounds-
dc.subject.keywordAuthorHigh-k Dielectric-
dc.subject.keywordAuthorLow Power Electronics-
dc.subject.keywordAuthorMos Devices-
dc.subject.keywordAuthorTransistors-
dc.subject.keywordAuthorZirconium Compounds-
dc.subject.keywordAuthorFerroelectric Hzo-
dc.subject.keywordAuthorField-effect Transistor-
dc.subject.keywordAuthorHigh- K-
dc.subject.keywordAuthorIgzo-
dc.subject.keywordAuthorLow-power Electronics-
dc.subject.keywordAuthorMetal Oxide Semiconductor-
dc.subject.keywordAuthorNegative Capacitance-
dc.subject.keywordAuthorProcessing Power-
dc.subject.keywordAuthorSub-threshold Swing(ss)-
dc.subject.keywordAuthorSubthreshold-
dc.subject.keywordAuthorOxide Semiconductors-
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