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Enhanced synaptic performance in hafnia-based ferroelectric memristors with MIFS structure for neuromorphic computingopen access

Authors
Lee, YoungseoKim, Sungjun
Issue Date
Oct-2025
Publisher
Elsevier Ltd
Keywords
CIFAR10; Ferroelectric memristor; Hafnium aluminium oxide; Short-term memory; Synaptic device
Citation
Ceramics International, v.51, no.25, pp 44919 - 44929
Pages
11
Indexed
SCIE
SCOPUS
Journal Title
Ceramics International
Volume
51
Number
25
Start Page
44919
End Page
44929
URI
https://scholarworks.dongguk.edu/handle/sw.dongguk/58865
DOI
10.1016/j.ceramint.2025.07.213
ISSN
0272-8842
1873-3956
Abstract
Hafnia-based ferroelectric memristors show great potential for neuromorphic computing by emulating artificial synaptic behavior. These devices offer excellent scalability and CMOS compatibility, with performance further enhanced by techniques such as aluminum doping and dielectric layer insertion. In this study, we investigate the metal-insulator-ferroelectric-semiconductor (MIFS) structure and compare it with the conventional metal-ferroelectric-semiconductor (MFS) structure. Electrical measurements revealed that MIFS exhibits a wide memory window, a high tunneling electro-resistance (TER) ratio of ∼911 %, and superior array scalability (up to 145 × 145) due to reduced sneak-path currents. Furthermore, the MIFS structure demonstrates biologically inspired synaptic behaviors such as potentiation/depression, excitatory postsynaptic current (EPSC), and paired pulse facilitation (PPF). When applied to machine learning tasks using fashion modified national institute of standards and technology (Fashion MNIST) and Canadian institute for advanced research 10 (CIFAR10) datasets, the device achieved high classification accuracy, confirming its viability for neuromorphic applications. © 2025 Elsevier Ltd and Techna Group S.r.l.
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