Effects of Thermal Annealing on Electrostatic Capacitance Properties for High-k ZrO2 Layers Grown on Ge

이세준

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Effects of Thermal Annealing on Electrostatic Capacitance Properties for High-k ZrO2 Layers Grown on Ge

Authors: 이세준

Issue Date: 15-Aug-2017

URI: https://scholarworks.dongguk.edu/handle/sw.dongguk/53466

Place: 대한민국
UCLA

Conference Name: 2017 Advances in Functional Materials Conference

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Appears in Collections: ETC > 2. Conference Papers

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