Irregular Resistive Switching Behaviors of Al2O3-Based Resistor with Cu Electrodeopen access
- Authors
- Ryu, Hojeong; Kim, Sungjun
- Issue Date
- Apr-2021
- Publisher
- MDPI
- Keywords
- memristor; resistive switching; metal oxides; resistive switching failure
- Citation
- METALS, v.11, no.4
- Indexed
- SCIE
SCOPUS
- Journal Title
- METALS
- Volume
- 11
- Number
- 4
- URI
- https://scholarworks.dongguk.edu/handle/sw.dongguk/5162
- DOI
- 10.3390/met11040653
- ISSN
- 2075-4701
2075-4701
- Abstract
- In this work, we examined the irregular resistive switching behaviors of a complementary metal-oxide-semiconductor (CMOS)-compatible Cu/Al2O3/Si resistor device. X-ray photoelectron spectroscopy (XPS) analysis confirmed the chemical and material compositions of a Al2O3 thin film layer and Si substrate. Bipolar resistive switching occurred in a more stable manner than the unipolar resistive switching in the device did. Five cells were verified over 50 endurance cycles in terms of bipolar resistive switching, and a good retention was confirmed for 10,000 s in the high-resistance state (HRS) and the low-resistance state (LRS). Both high reset current (similar to 10 mA) and low reset current (<100 mu A) coexisted in the bipolar resistive switching. We investigated nonideal resistive switching behaviors such as negative-set and current overshoot, which could lead to resistive switching failure.
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- Appears in
Collections - College of Engineering > Department of Electronics and Electrical Engineering > 1. Journal Articles

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