Volatile Resistive Switching Characteristics of Pt/HfO2/TaOx/TiN Short-Term Memory Deviceopen access
- Authors
- Ryu, Hojeong; Kim, Sungjun
- Issue Date
- Aug-2021
- Publisher
- MDPI
- Keywords
- resistive switching; synaptic device; short-term memory; threshold switching
- Citation
- METALS, v.11, no.8
- Indexed
- SCIE
SCOPUS
- Journal Title
- METALS
- Volume
- 11
- Number
- 8
- URI
- https://scholarworks.dongguk.edu/handle/sw.dongguk/4694
- DOI
- 10.3390/met11081207
- ISSN
- 2075-4701
2075-4701
- Abstract
- In this work, we study the threshold switching and short-term memory plasticity of a Pt/HfO2/TaOx/TiN resistive memory device for a neuromorphic system. First, we verify the thickness and elemental characterization of the device stack through transmission electron microscopy (TEM) and an energy-dispersive X-ray spectroscopy (EDS) line scan. Volatile resistive switching with low compliance current is observed under the DC sweep in a positive bias. Uniform cell-to-cell and cycle-to-cycle DC I-V curves are achieved by means of a repetitive sweep. The mechanism of volatile switching is explained by the temporal generation of traps. Next, we initiate the accumulation of the conductance and a natural decrease in the current by controlling the interval time of the pulses. Finally, we conduct a neuromorphic simulation to calculate the pattern recognition accuracy. These results can be applicable to short-term memory applications such as temporal learning in a neuromorphic system.
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Collections - College of Engineering > Department of Electronics and Electrical Engineering > 1. Journal Articles

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