Gradually Modified Conductance in the Self-Compliance Region of an Atomic-Layer-Deposited Pt/TiO2/HfAlOx/TiN RRAM Deviceopen access
- Authors
- Ryu, Hojeong; Kim, Sungjun
- Issue Date
- Aug-2021
- Publisher
- MDPI
- Keywords
- resistive switching; synaptic device; self-compliance; bilayer stack
- Citation
- METALS, v.11, no.8
- Indexed
- SCIE
SCOPUS
- Journal Title
- METALS
- Volume
- 11
- Number
- 8
- URI
- https://scholarworks.dongguk.edu/handle/sw.dongguk/4682
- DOI
- 10.3390/met11081199
- ISSN
- 2075-4701
2075-4701
- Abstract
- This study presents conductance modulation in a Pt/TiO2/HfAlOx/TiN resistive memory device in the compliance region for neuromorphic system applications. First, the chemical and material characteristics of the atomic-layer-deposited films were verified by X-ray photoelectron spectroscopy depth profiling. The low-resistance state was effectively controlled by the compliance current, and the high-resistance state was adjusted by the reset stop voltage. Stable endurance and retention in bipolar resistive switching were achieved. When a compliance current of 1 mA was imposed, only gradual switching was observed in the reset process. Self-compliance was used after an abrupt set transition to achieve a gradual set process. Finally, 10 cycles of long-term potentiation and depression were obtained in the compliance current region for neuromorphic system applications.
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Collections - College of Engineering > Department of Electronics and Electrical Engineering > 1. Journal Articles

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