Cited 8 time in
Gradually Modified Conductance in the Self-Compliance Region of an Atomic-Layer-Deposited Pt/TiO2/HfAlOx/TiN RRAM Device
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Ryu, Hojeong | - |
| dc.contributor.author | Kim, Sungjun | - |
| dc.date.accessioned | 2023-04-27T16:40:43Z | - |
| dc.date.available | 2023-04-27T16:40:43Z | - |
| dc.date.issued | 2021-08 | - |
| dc.identifier.issn | 2075-4701 | - |
| dc.identifier.issn | 2075-4701 | - |
| dc.identifier.uri | https://scholarworks.dongguk.edu/handle/sw.dongguk/4682 | - |
| dc.description.abstract | This study presents conductance modulation in a Pt/TiO2/HfAlOx/TiN resistive memory device in the compliance region for neuromorphic system applications. First, the chemical and material characteristics of the atomic-layer-deposited films were verified by X-ray photoelectron spectroscopy depth profiling. The low-resistance state was effectively controlled by the compliance current, and the high-resistance state was adjusted by the reset stop voltage. Stable endurance and retention in bipolar resistive switching were achieved. When a compliance current of 1 mA was imposed, only gradual switching was observed in the reset process. Self-compliance was used after an abrupt set transition to achieve a gradual set process. Finally, 10 cycles of long-term potentiation and depression were obtained in the compliance current region for neuromorphic system applications. | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | MDPI | - |
| dc.title | Gradually Modified Conductance in the Self-Compliance Region of an Atomic-Layer-Deposited Pt/TiO2/HfAlOx/TiN RRAM Device | - |
| dc.type | Article | - |
| dc.publisher.location | 스위스 | - |
| dc.identifier.doi | 10.3390/met11081199 | - |
| dc.identifier.scopusid | 2-s2.0-85111318622 | - |
| dc.identifier.wosid | 000689343900001 | - |
| dc.identifier.bibliographicCitation | METALS, v.11, no.8 | - |
| dc.citation.title | METALS | - |
| dc.citation.volume | 11 | - |
| dc.citation.number | 8 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | Y | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalResearchArea | Metallurgy & Metallurgical Engineering | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
| dc.relation.journalWebOfScienceCategory | Metallurgy & Metallurgical Engineering | - |
| dc.subject.keywordPlus | RESISTIVE SWITCHING PROPERTIES | - |
| dc.subject.keywordPlus | MEMRISTOR | - |
| dc.subject.keywordPlus | HFO2 | - |
| dc.subject.keywordAuthor | resistive switching | - |
| dc.subject.keywordAuthor | synaptic device | - |
| dc.subject.keywordAuthor | self-compliance | - |
| dc.subject.keywordAuthor | bilayer stack | - |
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