Multi-Level Resistive Switching of Pt/HfO2/TaN Memory Deviceopen access
- Authors
- Ryu, Hojeong; Jung, Hoeje; Lee, Kisong; Kim, Sungjun
- Issue Date
- Dec-2021
- Publisher
- MDPI
- Keywords
- memristor; threshold switching; resistive switching; metal oxides
- Citation
- METALS, v.11, no.12
- Indexed
- SCIE
SCOPUS
- Journal Title
- METALS
- Volume
- 11
- Number
- 12
- URI
- https://scholarworks.dongguk.edu/handle/sw.dongguk/4121
- DOI
- 10.3390/met11121885
- ISSN
- 2075-4701
2075-4701
- Abstract
- This work characterizes resistive switching and neuromorphic simulation of Pt/HfO2/TaN stack as an artificial synaptic device. A stable bipolar resistive switching operation is performed by repetitive DC sweep cycles. Furthermore, endurance (DC 100 cycles) and retention (5000 s) are demonstrated for reliable resistive operation. Low-resistance and high-resistance states follow the Ohmic conduction and Poole-Frenkel emission, respectively, which is verified through the fitting process. For practical operation, the set and reset processes are performed through pulses. Further, potentiation and depression are demonstrated for neuromorphic application. Finally, neuromorphic system simulation is performed through a neural network for pattern recognition accuracy of the Fashion Modified National Institute of Standards and Technology dataset.
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- Appears in
Collections - College of Engineering > Department of Information and Communication Engineering > 1. Journal Articles
- College of Engineering > Department of Electronics and Electrical Engineering > 1. Journal Articles

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