Microstructural and electrical properties evaluation of lead doped tin sulfide thin films
- Authors
- Sebastian, S.; Kulandaisamy, I; Valanarasu, S.; Yahia, I. S.; Kim, Hyun-Seok; Vikraman, Dhanasekaran
- Issue Date
- Jan-2020
- Publisher
- SPRINGER
- Keywords
- SnS:Pb; Thin film; XRD; Microstructural; Resistivity; p-n junction
- Citation
- JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY, v.93, no.1, pp 52 - 61
- Pages
- 10
- Indexed
- SCIE
SCOPUS
- Journal Title
- JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY
- Volume
- 93
- Number
- 1
- Start Page
- 52
- End Page
- 61
- URI
- https://scholarworks.dongguk.edu/handle/sw.dongguk/7035
- DOI
- 10.1007/s10971-019-05169-y
- ISSN
- 0928-0707
1573-4846
- Abstract
- A low cost and simple spray methodology with nebulizer was employed to fabricate lead doped tin sulfide (SnS:Pb) thin films. Different doping weight percentages (1, 3, 5, 7, and 9 wt%) were used to prepare SnS:Pb thin films on glass substrates with 350 degrees C substrate temperature, and we subsequently investigated Pb element influence on microstructural, electrical, and optical properties. Structural studies using X-ray diffraction confirmed orthorhombic crystal structure with (111) plane preferred orientation and atomic force micrographs identified significant variation due to the different Pb wt%. Photoluminescence showed a strong band edge emission peak at 761 nm, with optical band gaps at 1.90-1.60 eV over the Pb dopant concentrations. Hall effect showed low electrical resistivity (3.01 x 10(-2) Omega cm), high carrier concentration (similar to 1.01 x 10(19) cm(-3)), and high Hall mobility (similar to 20.5 cm(2) V-1 s(-1)) for 7 wt%, which is suitable to fabricate solar cell devices. The p-n junction properties were analyzed under dark and illumination conditions by current-voltage characteristics using the FTO/n-CdS/p-SnS:Pb/Al structure. [GRAPHICS] .
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Collections - College of Engineering > Department of Electronics and Electrical Engineering > 1. Journal Articles

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