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희생층이 도입된 탐침 기반 리소그래피
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 장재원 | - |
| dc.contributor.author | 조정식 | - |
| dc.date.accessioned | 2025-11-29T04:30:12Z | - |
| dc.date.available | 2025-11-29T04:30:12Z | - |
| dc.identifier.uri | https://scholarworks.dongguk.edu/handle/sw.dongguk/62194 | - |
| dc.description.abstract | 탐침기반리소그래피 기법에 희생층을 도입 활용하여 금 나노구명을 제작하는 방법 및 이를 활용한 응용을 보고함. | - |
| dc.title | 희생층이 도입된 탐침 기반 리소그래피 | - |
| dc.title.alternative | tip based lithography with a sacrificial layer | - |
| dc.type | Patent | - |
| dc.publisher.location | 대한민국 | - |
| dc.contributor.assignee | 동국대학교산학협력단 | - |
| dc.date.application | 2024-01-31 | - |
| dc.date.registration | 2025-11-19 | - |
| dc.type.iprs | 특허 | - |
| dc.identifier.patentRegistrationNumber | 10-2889959 | - |
| dc.identifier.patentApplicationNumber | 10-2024-0015047 | - |
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Related Researcher
- Jang, Jae Won
- College of Advanced Convergence Engineering (Division of System Semiconductor)