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Cited 27 time in webofscience Cited 29 time in scopus
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Synaptic Characteristics from Homogeneous Resistive Switching in Pt/Al2O3/TiN Stack

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dc.contributor.authorRyu, Hojeong-
dc.contributor.authorKim, Sungjun-
dc.date.accessioned2023-04-27T21:40:44Z-
dc.date.available2023-04-27T21:40:44Z-
dc.date.issued2020-10-
dc.identifier.issn2079-4991-
dc.identifier.issn2079-4991-
dc.identifier.urihttps://scholarworks.dongguk.edu/handle/sw.dongguk/6089-
dc.description.abstractIn this work, we propose three types of resistive switching behaviors by controlling operation conditions. We confirmed well-known filamentary switching in Al2O3-based resistive switching memory using the conventional device working operation with a forming process. Here, filamentary switching can be classified into two types depending on the compliance current. On top of that, the homogeneous switching is obtained by using a negative differential resistance effect before the forming or setting process in a negative bias. The variations of the low-resistance and high-resistance states in the homogeneous switching are comparable to the filamentary switching cases. However, the drift characteristics of the low-resistance and high-resistance states in the homogeneous switching are unstable with time. Therefore, the short-term plasticity effects, such as the current decay in repeated pulses and paired pulses facilitation, are demonstrated when using the resistance drift characteristics. Finally, the conductance can be increased and decreased by 50 consecutive potentiation pulses and 50 consecutive depression pulses, respectively. The linear conductance update in homogeneous switching is achieved compared to the filamentary switching, which ensures the high pattern-recognition accuracy.-
dc.format.extent11-
dc.language영어-
dc.language.isoENG-
dc.publisherMDPI-
dc.titleSynaptic Characteristics from Homogeneous Resistive Switching in Pt/Al2O3/TiN Stack-
dc.typeArticle-
dc.publisher.location스위스-
dc.identifier.doi10.3390/nano10102055-
dc.identifier.scopusid2-s2.0-85092768013-
dc.identifier.wosid000586153000001-
dc.identifier.bibliographicCitationNANOMATERIALS, v.10, no.10, pp 1 - 11-
dc.citation.titleNANOMATERIALS-
dc.citation.volume10-
dc.citation.number10-
dc.citation.startPage1-
dc.citation.endPage11-
dc.type.docTypeArticle-
dc.description.isOpenAccessY-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryChemistry, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusFILAMENTARY-
dc.subject.keywordPlusMEMRISTORS-
dc.subject.keywordPlusMEMORY-
dc.subject.keywordAuthormemristor-
dc.subject.keywordAuthorsynapse device-
dc.subject.keywordAuthorneuromorphic computing-
dc.subject.keywordAuthorhomogeneous resistive switching-
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