Rapid Solution Process for High Performance and Stable Amorphous Metal Oxide Thin Film Transistors by Water Vapor Annealing

노용영

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Rapid Solution Process for High Performance and Stable Amorphous Metal Oxide Thin Film Transistors by Water Vapor Annealing

Authors: 노용영

Issue Date: 21-Aug-2015

URI: https://scholarworks.dongguk.edu/handle/sw.dongguk/51190

Place: 대한민국
EXCO

Conference Date: 2015-08-18 ~ 2015-08-21

Conference Name: IMID 2015(The 15th International Meeting on Information Display)

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Appears in Collections: ETC > 2. Conference Papers

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