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Improvement of electrical characteristic of InGaZnO thin film transistor by combined post processing of hydrogen irradiation and low temperature annealing

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dc.contributor.author정권범-
dc.date.accessioned2024-10-30T15:23:17Z-
dc.date.available2024-10-30T15:23:17Z-
dc.date.issued2014-10-22-
dc.identifier.urihttps://scholarworks.dongguk.edu/handle/sw.dongguk/50114-
dc.titleImprovement of electrical characteristic of InGaZnO thin film transistor by combined post processing of hydrogen irradiation and low temperature annealing-
dc.typeConference-
dc.citation.startPage83-
dc.citation.endPage83-
dc.citation.conferenceName한국물리학회 가을학술논문발표회-
dc.citation.conferencePlace대한민국-
dc.citation.conferencePlace광주 김대중컨벤션센터-
dc.citation.conferenceDate2014-10-22 ~ 2014-10-24-
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