Cited 99 time in
Demonstration of synaptic and resistive switching characteristics in W/TiO2/HfO2/TaN memristor crossbar array for bioinspired neuromorphic computing
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Ismail, Muhammad | - |
| dc.contributor.author | Chand, Umesh | - |
| dc.contributor.author | Mahata, Chandreswar | - |
| dc.contributor.author | Nebhen, Jamel | - |
| dc.contributor.author | Kim, Sungjun | - |
| dc.date.accessioned | 2023-04-27T13:40:48Z | - |
| dc.date.available | 2023-04-27T13:40:48Z | - |
| dc.date.issued | 2022-01 | - |
| dc.identifier.issn | 1005-0302 | - |
| dc.identifier.issn | 1941-1162 | - |
| dc.identifier.uri | https://scholarworks.dongguk.edu/handle/sw.dongguk/3709 | - |
| dc.description.abstract | In this study, resistive random-access memory (RRAM)-based crossbar arrays with a memristor W/TiO2/HfO2/TaN structure were fabricated through atomic layer deposition (ALD) to investigate synaptic plasticity and resistive switching (RS) characteristics for bioinspired neuromorphic computing. X-ray photoelectron spectroscopy (XPS) was employed to explore oxygen vacancy concentrations in bilayer TiO2/HfO2 films. Gaussian fitting for O1s peaks confirmed that the HfO2 layer contained a larger number of oxygen vacancies than the TiO2 layer. In addition, HfO2 had lower Gibbs free energy (Delta G degrees = -1010.8 kJ/mol) than the TiO2 layer (Delta G degrees=-924.0 kJ/mol), resulting in more oxygen vacancies in the HfO2 layer. XPS results and AG degrees magnitudes confirmed that formation/disruption of oxygen-based conductive filaments took place in the TiO2 layer. The W/TiO2/HfO2/TaN memristive device exhibited excellent and repeatable RS characteristics, including superb 10(3) dc switching cycles, outstanding 10 7 pulse endurance, and high-thermal stability (10(4) s at 125 degrees C) important for digital computing systems. Furthermore, some essential biological synaptic characteristics such as potentiation-depression plasticity, paired-pulse facilitation (PPF), and spike-timing-dependent plasticity (STDP, asymmetric Hebbian and asymmetric antiHebbian) were successfully mimicked herein using the crossbar-array memristive device. Based on experimental results, a migration and diffusion of oxygen vacancy based physical model is proposed to describe the synaptic plasticity and RS mechanism. This study demonstrates that the proposed W/TiO2/HfO2/TaN memristor crossbar-array has a significant potential for applications in non-volatile memory (NVM) and bioinspired neuromorphic systems. (C) 2022 Published by Elsevier Ltd on behalf of The editorial office of Journal of Materials Science & Technology. | - |
| dc.format.extent | 9 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | Elsevier Ltd. | - |
| dc.title | Demonstration of synaptic and resistive switching characteristics in W/TiO2/HfO2/TaN memristor crossbar array for bioinspired neuromorphic computing | - |
| dc.type | Article | - |
| dc.publisher.location | 네델란드 | - |
| dc.identifier.doi | 10.1016/j.jmst.2021.04.025 | - |
| dc.identifier.scopusid | 2-s2.0-85107824571 | - |
| dc.identifier.wosid | 000737281900001 | - |
| dc.identifier.bibliographicCitation | Journal of Materials Science & Technology, v.96, pp 94 - 102 | - |
| dc.citation.title | Journal of Materials Science & Technology | - |
| dc.citation.volume | 96 | - |
| dc.citation.startPage | 94 | - |
| dc.citation.endPage | 102 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | Y | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalResearchArea | Metallurgy & Metallurgical Engineering | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
| dc.relation.journalWebOfScienceCategory | Metallurgy & Metallurgical Engineering | - |
| dc.subject.keywordPlus | ATOMIC LAYER DEPOSITION | - |
| dc.subject.keywordPlus | BILAYER | - |
| dc.subject.keywordPlus | MEMORY | - |
| dc.subject.keywordPlus | TRANSITION | - |
| dc.subject.keywordPlus | SYNAPSES | - |
| dc.subject.keywordPlus | FILM | - |
| dc.subject.keywordPlus | UNIFORMITY | - |
| dc.subject.keywordPlus | DEVICE | - |
| dc.subject.keywordPlus | ALD | - |
| dc.subject.keywordAuthor | Resistive switching | - |
| dc.subject.keywordAuthor | Crossbar-array memristive device | - |
| dc.subject.keywordAuthor | Synaptic plasticity | - |
| dc.subject.keywordAuthor | TiO2/HfO2 film | - |
| dc.subject.keywordAuthor | Oxygen vacancy | - |
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