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Simulation of sub-0.1um T-gate Trilayer Process in HEMTs for Millimeter-Qave Frequencies Using 50-kV and 100-kV Electron Beam Lithography System
- Authors
- 이진구
- Issue Date
- 30-Jun-2003
- Place
- 대한민국
부산
- Conference Date
- 2003-06-30 ~ 2003-07-02
- Conference Name
- AWAD 2003 conference
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Collections - ETC > 2. Conference Papers
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