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Band alignment and defect states in amorphous GaInZnO thin films grown on SiO2/Si substrates

Authors
Heo, SungChung, JaeGwanLee, Jae CheolSong, TaewonKim, Seong HeonYun, Dong-JinLee, Hyung IkKim, KiHongPark, Gyeong SuOh, Jong SooKwak, Dong WookLee, DongWhaCho, Hoon YoungTahi, DahlangKang, Hee JaeChoi, Byoung-Deog
Issue Date
Oct-2016
Publisher
WILEY-BLACKWELL
Keywords
defect states; GIZO; REELS; TSEE; PICTS; XPS
Citation
SURFACE AND INTERFACE ANALYSIS, v.48, no.10, pp 1062 - 1065
Pages
4
Indexed
SCI
SCIE
SCOPUS
Journal Title
SURFACE AND INTERFACE ANALYSIS
Volume
48
Number
10
Start Page
1062
End Page
1065
URI
https://scholarworks.dongguk.edu/handle/sw.dongguk/23893
DOI
10.1002/sia.6024
ISSN
0142-2421
1096-9918
Abstract
The band alignment and defect states of GaInZnO thin films grown on SiO2/Si via radio frequency (RF) magnetron sputtering were investigated by using X-ray photoelectron spectroscopy, reflection electron energy loss spectroscopy, thermally stimulated exo-electron emission and photo-induced current transient spectroscopy.The band gap via reflection electron energy loss spectroscopy was 3.2eV. The defect states via photo-induced current transient spectroscopy and thermally stimulated exo-electron emission were at 0.24, 0.53, 1.69 and 2.01eV below the conduction band minimum of GIZO thin films, respectively. The defect states at 0.24 and 0.53eV are related to the field-effect mobility, and the defect stated at 1.69 and 2.01eV is related to the oxygen vacancy defect. Copyright (c) 2016 John Wiley & Sons, Ltd.
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