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Wettability Conversion of an Aluminum-hydroxide Nanostructure by Ion Implantation
- Issue Date
- Apr-2016
- Publisher
- KOREAN PHYSICAL SOC
- Keywords
- Aluminum hydroxide; Ion implantation; Xe ions; Contact angle; X-ray photoelectron spectroscopy
- Citation
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.68, no.8, pp L1024 - L1028
- Indexed
- SCI
SCIE
SCOPUS
KCI
- Journal Title
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY
- Volume
- 68
- Number
- 8
- Start Page
- L1024
- End Page
- L1028
- ISSN
- 0374-4884
1976-8524
- Abstract
- This work presents a method for controlling the wettability of an aluminum-hydroxide (Al(OH)(3)) nanostructure by using ion implantation. We implant Xe ions into Al(OH)(3) nanostructures at dosages between 5 x 10(14) to 1 x 10(16) ions/cm(2). The microscopic surface morphology of the nanostructure after implantation does not change under our dosing conditions. However, a drastic increase in the surface contact angle (CA) from 0 degrees to 100 degrees is observed at a dosage of 5 x 10 15 ions/cm(2). We attribute this significant change in CA to the composition and chemical bonding states of carbon contained within the Al(OH)(3) nanostructure.
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Related Researcher
- Chung, Kwun Bum
- College of Natural Science (Department of Physics)