Cited 2 time in
Modulation of electrical mobility in Au ion irradiated titanium oxide with crystal field splitting
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Park, Hyun-Woo | - |
| dc.contributor.author | Jun, Byung-Hyuk | - |
| dc.contributor.author | Choi, Dukhyun | - |
| dc.contributor.author | Chung, Kwun-Bum | - |
| dc.date.accessioned | 2024-09-26T09:03:01Z | - |
| dc.date.available | 2024-09-26T09:03:01Z | - |
| dc.date.issued | 2016-11 | - |
| dc.identifier.issn | 0021-4922 | - |
| dc.identifier.issn | 1347-4065 | - |
| dc.identifier.uri | https://scholarworks.dongguk.edu/handle/sw.dongguk/23873 | - |
| dc.description.abstract | Electrical modulation of radio frequency (RF) sputtered TiO2-x films were investigated as a function of Au swift heavy ion irradiation dose at room temperature. The prepared TiO2-x films were irradiated with 130MeV Au swift heavy ion in the range from 1x 10(11) to 5 x 10(12) ions/cm(2). As the Au ion irradiation dose increased up to 1 x 10(12) ions/cm(2), the electrical mobility of TiO2-x films were dramatically increased 3.07 x 10(2) cm(2)V(-1) s(-1) without the change of carrier concentration. These changes in electrical properties of Au irradiated TiO2-x film, are related to the modification of electronic structure such as crystal field splitting of Ti 3d orbital hybridization and sub-band edge states below the conduction band as a function of Au swift heavy ion irradiation dose. (C) 2016 The Japan Society of Applied Physics | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | IOP PUBLISHING LTD | - |
| dc.title | Modulation of electrical mobility in Au ion irradiated titanium oxide with crystal field splitting | - |
| dc.type | Article | - |
| dc.publisher.location | 영국 | - |
| dc.identifier.doi | 10.7567/JJAP.55.115701 | - |
| dc.identifier.scopusid | 2-s2.0-84994713377 | - |
| dc.identifier.wosid | 000386512200001 | - |
| dc.identifier.bibliographicCitation | JAPANESE JOURNAL OF APPLIED PHYSICS, v.55, no.11 | - |
| dc.citation.title | JAPANESE JOURNAL OF APPLIED PHYSICS | - |
| dc.citation.volume | 55 | - |
| dc.citation.number | 11 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | sci | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.subject.keywordPlus | THIN-FILM TRANSISTORS | - |
| dc.subject.keywordPlus | ROOM-TEMPERATURE | - |
| dc.subject.keywordPlus | TIO2 | - |
| dc.subject.keywordPlus | FABRICATION | - |
| dc.subject.keywordPlus | ANATASE | - |
| dc.subject.keywordPlus | CHANNEL | - |
| dc.subject.keywordPlus | METALS | - |
| dc.subject.keywordPlus | TRACKS | - |
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