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Synthesis and characterization of Si/ZnO coaxial nanorod heterostructure on (100) Si substrate

Authors
Cho, Hak DongCho, Hoon YoungKwak, Dong WookKang, Tae WonYoon, Im Taek
Issue Date
1-Mar-2016
Publisher
ELSEVIER
Keywords
Nanorod; Nanostructures; Chemicalvapordepositionprocesses; Silicon; ZnO
Citation
JOURNAL OF CRYSTAL GROWTH, v.437, pp 26 - 31
Pages
6
Indexed
SCI
SCIE
SCOPUS
Journal Title
JOURNAL OF CRYSTAL GROWTH
Volume
437
Start Page
26
End Page
31
URI
https://scholarworks.dongguk.edu/handle/sw.dongguk/23827
DOI
10.1016/j.jcrysgro.2015.11.031
ISSN
0022-0248
1873-5002
Abstract
One-dimensional ZnO nanorods were grown vertically on a (100) Si substrate using a vapor phase transport method. Following the fabrication of ZnO nanorods, Si layers were deposited by rapid thermal chemical vapor deposition (RTCVD) directly on the ZnO nanorod/Si (100) substrate. Field emission scanning electron microscopy revealed that a Si/ZnO nanorod coaxial heterostructure were synthesized vertically oriented along the (002) plane on a Si substrate. X-ray diffraction, Energy dispersive X-ray and Raman spectroscopy revealed that the ZnO nanorods were single crystals with a hexagonal structure, and grew with a c-axis orientation perpendicular to the Si substrate, whereas the Si layer was poly-silicon with cubic structure. These results demonstrated the Si/ZnO nanorod coaxial heterostructure were synthesized successfully on a (100) Si substrate and the ZnO nanorod enables the synthesis of a vertically grown well-aligned Si/ZnO coaxial nanorod heterostructure. (C) 2015 Elsevier B.V. All rights reserved.
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