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Cited 14 time in webofscience Cited 14 time in scopus
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Stacked NbOx-based selector and ZrOx-based resistive memory for high-density crossbar array applications

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dc.contributor.authorCho, Youngboo-
dc.contributor.authorHeo, Jungang-
dc.contributor.authorKim, Sungjoon-
dc.contributor.authorKim, Sungjun-
dc.date.accessioned2024-08-08T10:00:40Z-
dc.date.available2024-08-08T10:00:40Z-
dc.date.issued2023-10-
dc.identifier.issn2468-0230-
dc.identifier.issn2468-0230-
dc.identifier.urihttps://scholarworks.dongguk.edu/handle/sw.dongguk/21061-
dc.description.abstractResistive random-access memory (RRAM) is a promising candidate for next-generation nonvolatile memory (NVM). Furthermore, RRAM is highly suitable for integration as a crossbar array (CBA). An RRAM-based CBA (R-CBA) shows various promising features in the fields of in-memory and neuromorphic computing. However, sneak-path current through unselected cells is a major obstacle in large-scale R-CBA development. To solve this issue, we propose a TiN/ZrOx/NbOx/Pt one selector-one resistor (1S1R) device structure that integrates the resistive switching and selector layer in a single stack. Material and electrical analyses were conducted to investigate the selector and resistive switching characteristics of the proposed device. The 1S1R device showed high selectivity (>5 × 101), low-resistance state/high-resistance state ratio (>5 × 101), long retention (>104 s), fast switching speeds (791 ns), stable operation, and excellent cell-by-cell variation. The conduction mechanism of the device was confirmed to be Schottky emission conduction. The maximum CBA size (139 × 139) was also obtained by calculating the read voltage margin. The proposed 1S1R device is suitable for large-scale CBA implementation and next-generation NVM. © 2023 Elsevier B.V.-
dc.format.extent9-
dc.language영어-
dc.language.isoENG-
dc.publisherElsevier B.V.-
dc.titleStacked NbOx-based selector and ZrOx-based resistive memory for high-density crossbar array applications-
dc.typeArticle-
dc.publisher.location네델란드-
dc.identifier.doi10.1016/j.surfin.2023.103273-
dc.identifier.scopusid2-s2.0-85168850587-
dc.identifier.wosid001092991500001-
dc.identifier.bibliographicCitationSurfaces and Interfaces, v.41, pp 1 - 9-
dc.citation.titleSurfaces and Interfaces-
dc.citation.volume41-
dc.citation.startPage1-
dc.citation.endPage9-
dc.type.docTypeArticle-
dc.description.isOpenAccessY-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusMEMRISTOR-
dc.subject.keywordPlusDIODE-
dc.subject.keywordPlusRRAM-
dc.subject.keywordAuthorCrossbar array-
dc.subject.keywordAuthorResistive random-access memory-
dc.subject.keywordAuthorResistive switching-
dc.subject.keywordAuthorSchottky emission conduction-
dc.subject.keywordAuthorSelector-
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