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SCIESCOPUS
Development of Dual-Selective Chemiresistive Sensor for NH3 and NOx at Room Temperature Using MoS2/MoO2 Heterostructures

Muthumalai, K.; Manoharan, Mathankumar; Govindharaj, Kamaraj; Saravanan, Poovarasan; Haldorai, Yuvaraj; Sofer, Zdenek; Kumar, Ramasamy Thangavelu Rajendra

ArticleIssue Date2024CitationACS Applied Nano Materials, v.7, no.12, pp 14164 - 14173PublisherAmerican Chemical Society
SCIESCOPUS
Highly sensitive prismatic h-MoO3 sheets for temperature-dependent chemiresistive ammonia sensor

Muthumalai, K.; Panjulingam, Nandhini; Manoharan, Mathankumar; Govindharaj, Kamaraj; Saravanan, Poovarasan; Lakshmipathi, Senthilkumar; Haldorai, Yuvaraj; Kumar, Ramasamy Thangavelu Rajendra

ArticleIssue Date2024CitationJournal of Materials Science: Materials in Electronics, v.35, no.10PublisherSpringer Science+Business Media
SCIESCOPUS
Interconnected SnO2 nanoflakes decorated WO3 composites as wearable and ultrafast sensors for real-time wireless sleep quality tracking and breath disorder detection

Govindharaj, Kamaraj; Manoharan, Mathankumar; Muthumalai, K.; Poovarasan, Saravanan; Thirugnanam, Sarathi; Haldorai, Yuvaraj; Rajendra Kumar, Ramasamy Thangavelu

ArticleIssue Date2024CitationChemical Engineering Journal, v.482PublisherElsevier B.V.
SCIESCOPUS
Ni-doped (MoO3/MoS2) heterostructure chemiresistive sensor for dual selective detection of NH3 and NOx at room temperature

Muthumalai, K.; Manoharan, Mathankumar; Govindharaj, Kamaraj; Saravanan, Poovarasan; Haldorai, Yuvaraj; Sofer, Zdeněk; Rajendra Kumar, Ramasamy Thangavelu

ArticleIssue Date2025CitationCeramics International, v.51, no.1, pp 1017 - 1024PublisherElsevier Ltd
SCIESCOPUS
Sulfur vacancies promoted highly efficient visible light photocatalytic degradation of antibiotic and phenolic pollutants over WS2/rGO heterostructure

Kumar, Dharman Ranjith; Ranjith, Kugalur Shanmugam; Manoharan, Mathankumar; Haldorai, Yuvaraj; Han, Young-Kyu; Oh, Tae Hwan; Kumar, Ramasamy Thangavelu Rajendra

ArticleIssue Date2024CitationSeparation and Purification Technology, v.329, pp 1 - 10PublisherElsevier B.V.
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