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Atomic Layer Deposition of TiO2 using Titanium Isopropoxide and H2O: Operational Principle of Equipment and Parameter Setting

Cho, Karam; Park, Jung-Dong; Shin, Changhwan

ArticleIssue Date2016CitationJOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE, v.16, no.3, pp 346 - 351PublisherIEEK PUBLICATION CENTER
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Experimental Observation of Negative Capacitance in Organic/Ferroelectric Capacitor for Steep Switching MOSFET

Lee, Youngtaek; Jo, Jaesung; Cho, Karam; Oh, Sangheon; Park, Jung-Dong; Shin, Changhwan

ArticleIssue Date2017CitationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.17, no.5, pp 3469 - 3471PublisherAMER SCIENTIFIC PUBLISHERS
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