Preliminary investigation on the implementation of an artificial synapse using TaOx-based memristor with thermally oxidized active layer

Citations

WEB OF SCIENCE

7
Citations

SCOPUS

7

초록

This study presents a preliminary exploration of thermally oxidized TaOx-based memristors and their potential as artificial synapses. Unlike the 10-min annealed devices, which display instability due to current overshoots, the 5-min annealed device exhibits stable resistive switching, retention, and endurance characteristics. Moreover, our memristor showcases synaptic behaviors encompassing potentiation, depression, spike-timing-dependent plasticity, and excitatory postsynaptic currents. This synaptic emulation holds tremendous promise for applications in neuromorphic computing, offering the opportunity to replicate the adaptive learning principles observed in biological synapses. In addition, we evaluate the device's suitability for pattern recognition within a neural network using the modified National Institute of Standards and Technology dataset. Our assessment reveals that the Pt/TaOx/Ta memristor with an oxidized insulator achieves outstanding potential manifested by an accuracy of 93.25% for the identical pulse scheme and an impressive accuracy of 95.42% for the incremental pulse scheme.

키워드

Display Devices; Neurons; Oxidation; Pattern Recognition; 'current; Active Layer; Artificial Synapse; Current Overshoot; Memristor; Neuromorphic Computing; Resistive Switching; Spike Timing Dependent Plasticities; Switching Retention; Thermally Oxidized; Memristors; Article; Depression; Electric Potential; Endurance; Excitatory Postsynaptic Potential; Memristor; Nerve Cell Network; Pattern Recognition; Synapse; RESISTIVE SWITCHING PARAMETERS; NEURAL-NETWORK; RRAM; MEMORY; DEVICES; PLASTICITY; OVERSHOOT; MECHANISM; TERM
제목
Preliminary investigation on the implementation of an artificial synapse using TaOx-based memristor with thermally oxidized active layer
저자
Kim, Juri; Park, Yongjin; Lee, Jung-Kyu; Kim, Sungjun
DOI
10.1063/5.0182699
발행일
2023-12
유형
Article
저널명
The Journal of Chemical Physics
권
159
호
21
페이지
1 ~ 8