Influence of Quantum well Thickness Fluctuation on Optical Properties of InGaN/GaN Multi Quantum well Structure Grown by PA-MBE

  • Woo, Hyeonseok; 
  • Kim, Jongmin; 
  • Cho, Sangeun; 
  • Jo, Yongcheol; 
  • Roh, Cheong Hyun; 
  • 외 3명

초록

An InGaN/GaN multiple quantum well (MQW) structure is grown on a GaN/sapphire template using a plasma-assisted molecular beam epitaxy (PA-MBE). The fluctuation of the quantum well thickness formed from roughly-grown InGaN layer results in a disordered photoluminescence (PL) spectrum. The surface morphologies of the InGaN layers with various In compositions are investigated by reflection high energy electron diffraction (RHEED) and atomic force microscopy (AFM). A blurred InGaN/GaN hetero-interface and the non-uniform QW size is confirmed by high resolution transmission electron microscopy (HR-TEM). Inhomogeneity of the quantum confinement results in a degradation of the quantum efficiency even though the InGaN layer has a uniform In composition.

키워드

InGaN/GaN MQW; MBE; Hetero interface; Critical thickness
제목
Influence of Quantum well Thickness Fluctuation on Optical Properties of InGaN/GaN Multi Quantum well Structure Grown by PA-MBE
저자
Woo, Hyeonseok; Kim, Jongmin; Cho, Sangeun; Jo, Yongcheol; Roh, Cheong Hyun; Kim, Hyungsang; Hahn, Cheol-Koo; Im, Hyunsik
DOI
10.5757/ASCT.2017.26.3.52
발행일
2017-05
유형
Article
저널명
Applied Science and Convergence Technology
권
26
호
3
페이지
52 ~ 54