On Using nMOS-pMOS-Type Cells in a Threshold-Voltage Compensated CMOS RF-DC Rectifier

Citations

WEB OF SCIENCE

2
Citations

SCOPUS

2

초록

In this brief, we discuss the merits of using nMOS-pMOS (NP)-type cells instead of nMOS-nMOS (NN)-or pMOS-pMOS (PP)-type cells in a single-ended, threshold-voltage compensated CMOS RF-dc rectifier. By adopting the NP-type cells, we can avoid the degradation of the generated output dc voltage due to parasitic long interconnection wire capacitance, deep N-well to P-substrate junction capacitance, and additional body effect. For comparison, we have implemented two RF-dc rectifiers in a 28-nm 1P11M CMOS process. The measured results show that the implemented RF-dc rectifier with the NP-type cells achieves 0.7-dB higher input power sensitivity and 3 x faster recharging time than the other rectifier with the NN-type cells.

키워드

RectifiersWireThreshold voltageArtificial neural networksTransistorsRadio frequencySensitivityMOSFETLogic gatesJunctionsCMOS integrated circuitsRF-dc rectifierRF energy harvester (RFEH)threshold voltage compensation
제목
On Using nMOS-pMOS-Type Cells in a Threshold-Voltage Compensated CMOS RF-DC Rectifier
저자
Park, YoomiByun, Sangjin
DOI
10.1109/TVLSI.2024.3515110
발행일
2025-05
유형
Article
저널명
IEEE Transactions on Very Large Scale Integration (VLSI) Systems
33
5
페이지
1472 ~ 1476