Correlation between Optical Localization-State and Electrical Deep-Level State in In0.52Al0.48As/In0.53Ga0.47As Quantum Well Structure

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초록

The peculiar correlationship between the optical localization-state and the electrical deep-level defect-state was observed in the In0.52Al0.48As/In0.53Ga0.47As quantum well structure that comprises two quantum-confined electron-states and two hole-subbands. The sample clearly exhibited the Fermi edge singularity (FES) peak in its photoluminescence spectrum at 10-300 K; and the FES peak was analyzed in terms of the phenomenological line shape model with key physical parameters such as the Fermi energy, the hole localization energy, and the band-to-band transition amplitude. Through the comprehensive studies on both the theoretical calculation and the experimental evaluation of the energy band profile, we found out that the localized state, which is separated above by similar to 0.07 eV from the first excited hole-subband, corresponds to the deep-level state, residing at the position of similar to 0.75 eV far below the conduction band (i.e., near the valence band edge).

키워드

InAlAs/InGaAs heterostructurefermi-edge singularityphotoluminescencedeep level transient spectroscopyFERMI-EDGE SINGULARITYTEMPERATURE-DEPENDENCEEXCITONIC EMISSIONPHOTOLUMINESCENCESPECTROSCOPYGROWTHGAPINP
제목
Correlation between Optical Localization-State and Electrical Deep-Level State in In0.52Al0.48As/In0.53Ga0.47As Quantum Well Structure
저자
Ahn, Il-HoKim, Deuk YoungLee, Sejoon
DOI
10.3390/nano11030585
발행일
2021-03
유형
Article
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