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Atomic Layer Deposition of TiO2 using Titanium Isopropoxide and H2O: Operational Principle of Equipment and Parameter Setting
- Cho, Karam;
- Park, Jung-Dong;
- Shin, Changhwan
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8초록
Titanium dioxide (TiO2) films are deposited by atomic layer deposition (ALD) using titanium isopropoxide (TTIP) and H2O as precursors. The operating instructions for the ALD equipment are described in detail, along with the settings for relevant parameters. The thickness of the TiO2 film is measured, and thereby, the deposition rate is quantitatively estimated to verify the linearity of the deposition rate.
키워드
Atomic layer deposition; TiO2; titanium isopropoxide; H2O; RANDOM-ACCESS MEMORY; TITANATE THIN-FILMS; CAPACITORS; GROWTH
- 제목
- Atomic Layer Deposition of TiO2 using Titanium Isopropoxide and H2O: Operational Principle of Equipment and Parameter Setting
- 저자
- Cho, Karam; Park, Jung-Dong; Shin, Changhwan
- 발행일
- 2016-06
- 유형
- Article
- 권
- 16
- 호
- 3
- 페이지
- 346 ~ 351