Review on Se-and S-doped hydrogenated amorphous silicon thin films

  • Sharma, Sanjeev K.
  • Im, Hyunsik
  • Kim, Deuk Young
  • Mehra, R. M.
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초록

Hydrogenated amorphous silicon thin films manufactured by plasma deposition techniques are widely used in electronic and optoelectronic devices. The optical and electrical properties of undoped and doped hydrogenated amorphous silicon (a-Si:H) thin films determine the importance and characteristics of the final film structure of practical devices. In particular, a-Si:H thin film solar cells and optical sensors have many industrial and technical advantages, such as being light weight, low cost, and having a large deposition area. The a-Si:H thin film is one of the candidates for flexible solar cells for use in space. This article reviews the optical and electrical properties of double donor Se-and S-doped a-Si:H thin films, which can be considered as an alternative to wide bandgap absorbing layers in the next generation of optoelectronic devices.

키워드

Hydrogenated amorphous siliconDouble donorOptical-propertiesElectrical propertiesConduction mechanismMEYER-NELDEL RULESTEADY-STATE PHOTOCONDUCTIVITYPERSISTENT PHOTOCONDUCTIVITYOPTICAL-CONSTANTSX-RAYNANOCRYSTALLINE SILICONELECTRICAL-PROPERTIESA-SIHBAND-GAPTRANSIENT PHOTOCONDUCTIVITY
제목
Review on Se-and S-doped hydrogenated amorphous silicon thin films
저자
Sharma, Sanjeev K.Im, HyunsikKim, Deuk YoungMehra, R. M.
발행일
2014-05
유형
Review
저널명
Indian Journal of Pure and Applied Physics
52
5
페이지
293 ~ 313