Metal oxide semiconductor-based negative capacitance field-effect transistors with a sub-threshold swing of below 30 mV/dec

  • Min, Ji Hyeon; 
  • Jang, Seong Cheol; 
  • Kim, Kyong Jae; 
  • Rim, You Seung; 
  • Kim, Hyun-Suk
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초록

Effective data processing and low power consumption of electronic devices have been demanded for artificial intelligence technologies. Here, we report IGZO-based negative capacitance field-effect transistors (IGZO NC-FETs) with stacked gate dielectrics composed of ferroelectric Hf0.5Zr0.5O2 and high-k Al2O3. The manifestation of negative capacitance behavior was confirmed by the suppression of the thermionic subthreshold swing limit resulted in the improvement of low-power switching performance. The IGZO NC-FET occurs below 30 mV/dec of a steep subthreshold swing (SS), exceptionally across a gate bias range of ±1 V. Furthermore, high-k Al2O3 as a stabilizing layer suppresses the hysteresis, effectively coupled with a conventional ferroelectric layer. © 2025 Elsevier B.V., All rights reserved.

키워드

Ferroelectric Hzo; Igzo; Low-power Electronics; Negative Capacitance; Oxide Semiconductor; Subthreshold Swing; Aluminum Oxide; Capacitance; Data Handling; Ferroelectric Devices; Ferroelectric Materials; Ferroelectricity; Fluorine Compounds; Gate Dielectrics; Hafnium Compounds; High-k Dielectric; Low Power Electronics; Mos Devices; Transistors; Zirconium Compounds; Ferroelectric Hzo; Field-effect Transistor; High- K; Igzo; Low-power Electronics; Metal Oxide Semiconductor; Negative Capacitance; Processing Power; Sub-threshold Swing(ss); Subthreshold; Oxide Semiconductors; HYSTERESIS; SLOPE
제목
Metal oxide semiconductor-based negative capacitance field-effect transistors with a sub-threshold swing of below 30 mV/dec
저자
Min, Ji Hyeon; Jang, Seong Cheol; Kim, Kyong Jae; Rim, You Seung; Kim, Hyun-Suk
DOI
10.1016/j.mtelec.2025.100178
발행일
2025-12
유형
Article
저널명
Materials Today Electronics
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14
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