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Wet Chemical MESA Etching Using HCl-based and FeCl3 Light Sensitive Etchants for InP Gunn Diodes

  • 이진구
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Wet Chemical MESA Etching Using HCl-based and FeCl3 Light Sensitive Etchants for InP Gunn Diodes
저자
이진구
발행일
2008-04-21
학회명
2008 Global Symposium on Millimeter Waves
개최지
Nanjing International Exhibition Center
학회 개최일
2008-04-21 ~ 2008-04-24

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