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Volatile Resistive Switching Characteristics of Pt/HfO2/TaOx/TiN Short-Term Memory Device
- Ryu, Hojeong;
- Kim, Sungjun
WEB OF SCIENCE
13SCOPUS
13초록
In this work, we study the threshold switching and short-term memory plasticity of a Pt/HfO2/TaOx/TiN resistive memory device for a neuromorphic system. First, we verify the thickness and elemental characterization of the device stack through transmission electron microscopy (TEM) and an energy-dispersive X-ray spectroscopy (EDS) line scan. Volatile resistive switching with low compliance current is observed under the DC sweep in a positive bias. Uniform cell-to-cell and cycle-to-cycle DC I-V curves are achieved by means of a repetitive sweep. The mechanism of volatile switching is explained by the temporal generation of traps. Next, we initiate the accumulation of the conductance and a natural decrease in the current by controlling the interval time of the pulses. Finally, we conduct a neuromorphic simulation to calculate the pattern recognition accuracy. These results can be applicable to short-term memory applications such as temporal learning in a neuromorphic system.
키워드
- 제목
- Volatile Resistive Switching Characteristics of Pt/HfO2/TaOx/TiN Short-Term Memory Device
- 저자
- Ryu, Hojeong; Kim, Sungjun
- 발행일
- 2021-08
- 유형
- Article
- 저널명
- Metals
- 권
- 11
- 호
- 8