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Optimization of source-connected field plate in AlGaN/GaN HEMTs for high-performance and high-reliability operation: A simulation study

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dc.contributor.authorKim, Tae-Sung-
dc.contributor.authorWon, Young-Hyun-
dc.contributor.authorLim, Chae-Yun-
dc.contributor.authorLee, Jae-Hun-
dc.contributor.authorJeong, Ju-Hwan-
dc.contributor.authorPark, Jong Yul-
dc.contributor.authorChang, Sung-Jae-
dc.contributor.authorMin, Byoung-Gue-
dc.contributor.authorKang, Dong Min-
dc.contributor.authorKim, Hyun-Seok-
dc.date.accessioned2026-01-30T05:00:24Z-
dc.date.available2026-01-30T05:00:24Z-
dc.date.issued2026-05-
dc.identifier.issn1369-8001-
dc.identifier.issn1873-4081-
dc.identifier.urihttps://scholarworks.dongguk.edu/handle/sw.dongguk/63545-
dc.description.abstractThis study investigates the operational characteristics of AlGaN/GaN high-electron-mobility transistors (HEMTs) by systematically varying the top source-connected field plate length (L<inf>TSFP</inf>), which controls the overall source-connected field plate configuration. The simulation parameters are calibrated to measured data from fabricated 0.15 μm planar-gate AlGaN/GaN HEMTs with a source-connected field plate to maintain simulation reliability. The simulations identify the field plate configuration that co-optimizes DC, RF, and dynamic performances for L<inf>TSFP</inf> between 0.1 μm and the conventional 1.4 μm. The results demonstrate that an increase in L<inf>TSFP</inf> from 0.1 μm to 0.5 μm yields an approximately 9.34 % improvement in breakdown voltage (V<inf>BD</inf>); however, further increases beyond 0.5 μm show saturation with no significant enhancement. Additionally, the gate-to-source capacitance displays a significant decrease as L<inf>TSFP</inf> scales down from 1.4 μm to 0.5 μm, and it then reaches a plateau for further scaling to 0.1 μm. The cut-off frequency (f<inf>T</inf>) converges to approximately 46.23 GHz for L<inf>TSFP</inf> below 0.5 μm. As a result, the device with L<inf>TSFP</inf> of 0.5 μm achieves the highest Johnson's figure of merit (=V<inf>BD</inf>×f<inf>T</inf>) of 5.31 THz-V, representing a 28.29 % improvement over the conventional 1.4 μm configuration. Moreover, the dynamic performance metrics, characterized by the suppressed current collapse and reduced normalized on-resistance, show only marginal improvement for L<inf>TSFP</inf> values above 0.5 μm, which illustrates the limited benefit of further field plate extension in this regime. These findings indicate that AlGaN/GaN HEMTs with an optimized L<inf>TSFP</inf> effectively balance high-power, high-frequency, and reliable operations, making them promising candidates for advanced power electronics and RF applications. © 2026 Elsevier Ltd-
dc.format.extent9-
dc.language영어-
dc.language.isoENG-
dc.publisherElsevier Ltd-
dc.titleOptimization of source-connected field plate in AlGaN/GaN HEMTs for high-performance and high-reliability operation: A simulation study-
dc.typeArticle-
dc.publisher.location네델란드-
dc.identifier.doi10.1016/j.mssp.2026.110451-
dc.identifier.scopusid2-s2.0-105027637700-
dc.identifier.wosid001675759600001-
dc.identifier.bibliographicCitationMaterials Science in Semiconductor Processing, v.206, pp 1 - 9-
dc.citation.titleMaterials Science in Semiconductor Processing-
dc.citation.volume206-
dc.citation.startPage1-
dc.citation.endPage9-
dc.type.docTypeArticle-
dc.description.isOpenAccessY-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusCURRENT COLLAPSE-
dc.subject.keywordPlusGAN-
dc.subject.keywordPlusIMPACT-
dc.subject.keywordPlusDC-
dc.subject.keywordAuthorBreakdown voltage-
dc.subject.keywordAuthorCut-off frequency-
dc.subject.keywordAuthorDouble-pulsed drain current transient-
dc.subject.keywordAuthorDynamic on-resistance-
dc.subject.keywordAuthorField plate-
dc.subject.keywordAuthorGallium nitride-
dc.subject.keywordAuthorHigh-electron-mobility transistor-
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