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Optimization of source-connected field plate in AlGaN/GaN HEMTs for high-performance and high-reliability operation: A simulation study
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Tae-Sung | - |
| dc.contributor.author | Won, Young-Hyun | - |
| dc.contributor.author | Lim, Chae-Yun | - |
| dc.contributor.author | Lee, Jae-Hun | - |
| dc.contributor.author | Jeong, Ju-Hwan | - |
| dc.contributor.author | Park, Jong Yul | - |
| dc.contributor.author | Chang, Sung-Jae | - |
| dc.contributor.author | Min, Byoung-Gue | - |
| dc.contributor.author | Kang, Dong Min | - |
| dc.contributor.author | Kim, Hyun-Seok | - |
| dc.date.accessioned | 2026-01-30T05:00:24Z | - |
| dc.date.available | 2026-01-30T05:00:24Z | - |
| dc.date.issued | 2026-05 | - |
| dc.identifier.issn | 1369-8001 | - |
| dc.identifier.issn | 1873-4081 | - |
| dc.identifier.uri | https://scholarworks.dongguk.edu/handle/sw.dongguk/63545 | - |
| dc.description.abstract | This study investigates the operational characteristics of AlGaN/GaN high-electron-mobility transistors (HEMTs) by systematically varying the top source-connected field plate length (L<inf>TSFP</inf>), which controls the overall source-connected field plate configuration. The simulation parameters are calibrated to measured data from fabricated 0.15 μm planar-gate AlGaN/GaN HEMTs with a source-connected field plate to maintain simulation reliability. The simulations identify the field plate configuration that co-optimizes DC, RF, and dynamic performances for L<inf>TSFP</inf> between 0.1 μm and the conventional 1.4 μm. The results demonstrate that an increase in L<inf>TSFP</inf> from 0.1 μm to 0.5 μm yields an approximately 9.34 % improvement in breakdown voltage (V<inf>BD</inf>); however, further increases beyond 0.5 μm show saturation with no significant enhancement. Additionally, the gate-to-source capacitance displays a significant decrease as L<inf>TSFP</inf> scales down from 1.4 μm to 0.5 μm, and it then reaches a plateau for further scaling to 0.1 μm. The cut-off frequency (f<inf>T</inf>) converges to approximately 46.23 GHz for L<inf>TSFP</inf> below 0.5 μm. As a result, the device with L<inf>TSFP</inf> of 0.5 μm achieves the highest Johnson's figure of merit (=V<inf>BD</inf>×f<inf>T</inf>) of 5.31 THz-V, representing a 28.29 % improvement over the conventional 1.4 μm configuration. Moreover, the dynamic performance metrics, characterized by the suppressed current collapse and reduced normalized on-resistance, show only marginal improvement for L<inf>TSFP</inf> values above 0.5 μm, which illustrates the limited benefit of further field plate extension in this regime. These findings indicate that AlGaN/GaN HEMTs with an optimized L<inf>TSFP</inf> effectively balance high-power, high-frequency, and reliable operations, making them promising candidates for advanced power electronics and RF applications. © 2026 Elsevier Ltd | - |
| dc.format.extent | 9 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | Elsevier Ltd | - |
| dc.title | Optimization of source-connected field plate in AlGaN/GaN HEMTs for high-performance and high-reliability operation: A simulation study | - |
| dc.type | Article | - |
| dc.publisher.location | 네델란드 | - |
| dc.identifier.doi | 10.1016/j.mssp.2026.110451 | - |
| dc.identifier.scopusid | 2-s2.0-105027637700 | - |
| dc.identifier.wosid | 001675759600001 | - |
| dc.identifier.bibliographicCitation | Materials Science in Semiconductor Processing, v.206, pp 1 - 9 | - |
| dc.citation.title | Materials Science in Semiconductor Processing | - |
| dc.citation.volume | 206 | - |
| dc.citation.startPage | 1 | - |
| dc.citation.endPage | 9 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | Y | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Engineering | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
| dc.subject.keywordPlus | CURRENT COLLAPSE | - |
| dc.subject.keywordPlus | GAN | - |
| dc.subject.keywordPlus | IMPACT | - |
| dc.subject.keywordPlus | DC | - |
| dc.subject.keywordAuthor | Breakdown voltage | - |
| dc.subject.keywordAuthor | Cut-off frequency | - |
| dc.subject.keywordAuthor | Double-pulsed drain current transient | - |
| dc.subject.keywordAuthor | Dynamic on-resistance | - |
| dc.subject.keywordAuthor | Field plate | - |
| dc.subject.keywordAuthor | Gallium nitride | - |
| dc.subject.keywordAuthor | High-electron-mobility transistor | - |
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