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Scaled Indium Oxide Thin-Film Deposited by PEALD for 3D Ferroelectric-FET

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dc.contributor.author김현석-
dc.date.accessioned2026-01-17T00:00:59Z-
dc.date.available2026-01-17T00:00:59Z-
dc.date.issued2025-08-20-
dc.identifier.urihttps://scholarworks.dongguk.edu/handle/sw.dongguk/62936-
dc.titleScaled Indium Oxide Thin-Film Deposited by PEALD for 3D Ferroelectric-FET-
dc.typeConference-
dc.citation.startPage77-
dc.citation.endPage77-
dc.citation.conferenceNameIMID 2025-
dc.citation.conferencePlace대한민국-
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