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저온 큐어링을 이용한 게이트 절연막 형성방법 및 이를 이용한 유기박막트랜지스터 제조방법 (Method of gate dielectric formation using low temperature curing and Method for manufacturing organic thin film transistor using the same)
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김삼동 | - |
| dc.contributor.author | 이재서 | - |
| dc.contributor.author | 문성운 | - |
| dc.contributor.author | 오정훈 | - |
| dc.date.accessioned | 2025-12-22T01:14:02Z | - |
| dc.date.available | 2025-12-22T01:14:02Z | - |
| dc.identifier.uri | https://scholarworks.dongguk.edu/handle/sw.dongguk/62540 | - |
| dc.title | 저온 큐어링을 이용한 게이트 절연막 형성방법 및 이를 이용한 유기박막트랜지스터 제조방법 (Method of gate dielectric formation using low temperature curing and Method for manufacturing organic thin film transistor using the same) | - |
| dc.title.alternative | Method of gate dielectric formation using low temperature curing and Method for manufacturing organic thin film transistor using the same | - |
| dc.type | Patent | - |
| dc.publisher.location | 대한민국 | - |
| dc.contributor.assignee | 동국대학교산학협력단 | - |
| dc.date.application | 2009-08-18 | - |
| dc.date.registration | 2010-02-12 | - |
| dc.type.iprs | 특허 | - |
| dc.identifier.patentRegistrationNumber | 10-0943449 | - |
| dc.identifier.patentApplicationNumber | 10-2009-0076373 | - |
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