Cited 0 time in
A Survey of Training-free Diffusion-based Image Generation with Free-form Mask
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Park, Yoonseo | - |
| dc.contributor.author | Jo, Hyeongseob | - |
| dc.contributor.author | Cho, Sung In | - |
| dc.date.accessioned | 2025-09-25T06:30:13Z | - |
| dc.date.available | 2025-09-25T06:30:13Z | - |
| dc.date.issued | 2025 | - |
| dc.identifier.issn | 2997-7401 | - |
| dc.identifier.issn | 2997-741X | - |
| dc.identifier.uri | https://scholarworks.dongguk.edu/handle/sw.dongguk/61611 | - |
| dc.description.abstract | Layout-to-image generation is a task that generates realistic images based on given layouts and corresponding textual descriptions. The layout provides structural information about the image, such as descriptions, positions, and sizes of objects. Traditional methods for layout-to-image generation relied on bounding boxes, which represent only fixed-form layouts. Recently, approaches using free-form masks have gained attention, as they enable more flexible control over the shapes and positions of objects. Among these, training-free methods have been proposed that leverage pre-trained diffusion models without additional training. These methods adjust modified attention and guidance mechanisms to steer the image generation process during the inference phase of the diffusion model. In this paper, we review training-free diffusion-based image generation methods that utilize free-form masks. We focus on three representative methods: Paint-with-Words, MultiDiffusion, and Zero-Painter. We analyze their generation strategies and key mechanisms, as well as their limitations regarding spatial accuracy and consistency in object placement. © 2025 IEEE. | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | IEEE | - |
| dc.title | A Survey of Training-free Diffusion-based Image Generation with Free-form Mask | - |
| dc.type | Article | - |
| dc.publisher.location | 미국 | - |
| dc.identifier.doi | 10.1109/ITC-CSCC66376.2025.11137628 | - |
| dc.identifier.scopusid | 2-s2.0-105016391894 | - |
| dc.identifier.bibliographicCitation | 2025 International Technical Conference on Circuits/Systems, Computers, and Communications | - |
| dc.citation.title | 2025 International Technical Conference on Circuits/Systems, Computers, and Communications | - |
| dc.type.docType | Conference paper | - |
| dc.description.isOpenAccess | Y | - |
| dc.description.journalRegisteredClass | foreign | - |
| dc.subject.keywordAuthor | cross-attention | - |
| dc.subject.keywordAuthor | diffusion models | - |
| dc.subject.keywordAuthor | free-form mask | - |
| dc.subject.keywordAuthor | layout-to-image generation | - |
| dc.subject.keywordAuthor | training-free | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
30, Pildong-ro 1-gil, Jung-gu, Seoul, 04620, Republic of Korea+82-2-2260-3114
Copyright(c) 2023 DONGGUK UNIVERSITY. ALL RIGHTS RESERVED.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.
