Directly Photopatternable High-k poly(para-xylylene) as Gate Dielectric

김현석

Detailed Information

Cited 0 time in webofscience

Cited 0 time in scopus

Metadata Downloads

Directly Photopatternable High-k poly(para-xylylene) as Gate Dielectric

Authors: 김현석

Issue Date: 20-Aug-2024

URI: https://scholarworks.dongguk.edu/handle/sw.dongguk/57290

Place: 대한민국

Conference Name: IMID 2024

Files in This Item: There are no files associated with this item.

Appears in Collections: College of Engineering > Department of Energy and Materials Engineering > 2. Conference Papers

Show full item record

qrcode

Related Researcher

Researcher Kim, Hyun Suk photo

Kim, Hyun Suk: College of Engineering (Department of Energy and Materials Engineering)

Read more

Altmetrics

Total Views & Downloads

RSS_1.0 RSS_2.0 ATOM_1.0

30, Pildong-ro 1-gil, Jung-gu, Seoul, 04620, Republic of Korea+82-2-2260-3114

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.

Detailed Information

Related Researcher

Altmetrics

Total Views & Downloads

BROWSE