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Normally-off AlGaN/GaN HEMT with high breakdown voltage using recessed T-gate drain-field-plate (TGDFP) technology for RF power applications

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dc.contributor.author박현창-
dc.date.accessioned2024-10-30T13:23:41Z-
dc.date.available2024-10-30T13:23:41Z-
dc.date.issued2013-07-10-
dc.identifier.urihttps://scholarworks.dongguk.edu/handle/sw.dongguk/48535-
dc.titleNormally-off AlGaN/GaN HEMT with high breakdown voltage using recessed T-gate drain-field-plate (TGDFP) technology for RF power applications-
dc.typeConference-
dc.citation.startPage3-
dc.citation.endPage4-
dc.citation.conferenceNameNANO KOREA 2013-
dc.citation.conferencePlace대한민국-
dc.citation.conferencePlaceCoex-
dc.citation.conferenceDate2013-07-10 ~ 2013-07-12-
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