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Effect of Cu diffusion in Cu/TiN/SiO₂/Si capacitors by C-V measurements
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 신동혁 | - |
| dc.date.accessioned | 2024-10-30T04:02:18Z | - |
| dc.date.available | 2024-10-30T04:02:18Z | - |
| dc.date.issued | 1998-02-25 | - |
| dc.identifier.uri | https://scholarworks.dongguk.edu/handle/sw.dongguk/39837 | - |
| dc.title | Effect of Cu diffusion in Cu/TiN/SiO₂/Si capacitors by C-V measurements | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 한국반도체 학술대회 제5회 | - |
| dc.citation.conferencePlace | 대한민국 | - |
| dc.citation.conferencePlace | 서울 | - |
| dc.citation.conferenceDate | 1998-02-25 ~ 1998-02-27 | - |
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