High-Performance Memristive Synapse Composed of Ferroelectric ZnVO-Based Schottky Junctionopen access
- Authors
- Lee, Youngmin; Hong, Chulwoong; Sekar, Sankar; Lee, Sejoon
- Issue Date
- Mar-2024
- Publisher
- MDPI
- Keywords
- vanadium-doped ZnO; ferroelectric Schottky junction; synaptic device
- Citation
- Nanomaterials, v.14, no.6, pp 1 - 17
- Pages
- 17
- Indexed
- SCIE
SCOPUS
- Journal Title
- Nanomaterials
- Volume
- 14
- Number
- 6
- Start Page
- 1
- End Page
- 17
- URI
- https://scholarworks.dongguk.edu/handle/sw.dongguk/26312
- DOI
- 10.3390/nano14060506
- ISSN
- 2079-4991
2079-4991
- Abstract
- In pursuit of realizing neuromorphic computing devices, we demonstrated the high-performance synaptic functions on the top-to-bottom Au/ZnVO/Pt two-terminal ferroelectric Schottky junction (FSJ) device architecture. The active layer of ZnVO exhibited the ferroelectric characteristics because of the broken lattice-translational symmetry, arising from the incorporation of smaller V5+ ions into smaller Zn2+ host lattice sites. The fabricated FSJ devices displayed an asymmetric hysteresis behavior attributed to the ferroelectric polarization-dependent Schottky field-emission rate difference in between positive and negative bias voltage regions. Additionally, it was observed that the magnitude of the on-state current could be systematically controlled by changing either the amplitude or the width of the applied voltage pulses. Owing to these voltage pulse-tunable multi-state memory characteristics, the device revealed diverse synaptic functions such as short-term memory, dynamic range-tunable long-term memory, and versatile rules in spike time-dependent synaptic plasticity. For the pattern-recognition simulation, furthermore, more than 95% accuracy was recorded when using the optimized experimental device parameters. These findings suggest the ZnVO-based FSJ device holds significant promise for application in next-generation brain-inspired neuromorphic computing systems.
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Collections - College of Advanced Convergence Engineering > Division of System Semiconductor > 1. Journal Articles

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