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Cited 2 time in webofscience Cited 3 time in scopus
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Inorganic p-Type Tellurium-Based Synaptic Transistors: Complementary Synaptic Pairs with n-Type Devices for Energy-Efficient Operation

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dc.contributor.authorLee, Seung Min-
dc.contributor.authorPark, Ji-Min-
dc.contributor.authorAhn, Suhyeon-
dc.contributor.authorJang, Seong Cheol-
dc.contributor.authorKim, Hyungjin-
dc.contributor.authorKim, Hyun-Suk-
dc.date.accessioned2024-09-26T21:00:29Z-
dc.date.available2024-09-26T21:00:29Z-
dc.date.issued2024-07-
dc.identifier.issn2637-6113-
dc.identifier.issn2637-6113-
dc.identifier.urihttps://scholarworks.dongguk.edu/handle/sw.dongguk/26250-
dc.description.abstractNeuromorphic computing is a rapidly emerging technology that can overcome the limitations of von Neumann-type architecture-based computing systems, offering the potential for implementing next-generation computing architectures. Here, we propose a p-type three-terminal synaptic device that successfully mimics the function of biological synapses. The proposed tellurium (Te) synaptic transistors incorporating SiO2 or Al2O3 gate dielectric layers modulate the synaptic weight-that is, the channel conductance-essential for realizing synaptic characteristics. Synaptic devices with optimal Al2O3 layers exhibit large hysteresis properties that efficiently induce conductance modulation, demonstrating low power consumption, good linearity, and short-/long-term plasticity. Furthermore, the proposed optimal Te synaptic transistor achieved a high recognition accuracy of 93.8%. These findings suggest that Te-based synaptic devices fabricated utilizing thin-film processes could enhance the efficiency of future neuromorphic computing systems.-
dc.format.extent8-
dc.language영어-
dc.language.isoENG-
dc.publisherAmerican Chemical Society-
dc.titleInorganic p-Type Tellurium-Based Synaptic Transistors: Complementary Synaptic Pairs with n-Type Devices for Energy-Efficient Operation-
dc.typeArticle-
dc.publisher.location미국-
dc.identifier.doi10.1021/acsaelm.4c01027-
dc.identifier.scopusid2-s2.0-85197416069-
dc.identifier.wosid001261314500001-
dc.identifier.bibliographicCitationACS Applied Electronic Materials, v.6, no.7, pp 5371 - 5378-
dc.citation.titleACS Applied Electronic Materials-
dc.citation.volume6-
dc.citation.number7-
dc.citation.startPage5371-
dc.citation.endPage5378-
dc.type.docTypeArticle-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.subject.keywordPlusFIELD-EFFECT TRANSISTORS-
dc.subject.keywordPlusMODULATION-
dc.subject.keywordAuthorthin film-
dc.subject.keywordAuthortellurium-
dc.subject.keywordAuthoroxide gatedielectric-
dc.subject.keywordAuthorhigh-k dielectric constant-
dc.subject.keywordAuthorsynaptictransistors-
dc.subject.keywordAuthorneuromorphic computing-
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