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Cited 11 time in webofscience Cited 11 time in scopus
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Solid-State Electrolyte Dielectrics Based on Exceptional High-kP(VDF-TrFE-CTFE) Terpolymer for High-Performance Field-Effect Transistors

Authors
Nketia-Yawson, BenjaminTabi, Grace DansoaJo, Jea WoongNoh, Yong-Young
Issue Date
Sep-2020
Publisher
WILEY
Keywords
dielectric; electrolyte gated transistors; high-kdielectric; polymer blends; solid-state electrolytes
Citation
ADVANCED MATERIALS INTERFACES, v.7, no.17
Indexed
SCIE
SCOPUS
Journal Title
ADVANCED MATERIALS INTERFACES
Volume
7
Number
17
URI
https://scholarworks.dongguk.edu/handle/sw.dongguk/25769
DOI
10.1002/admi.202000842
ISSN
2196-7350
2196-7350
Abstract
High-performance and low-voltage organic and inorganic field-effect transistors (FETs) with solid-state electrolyte gate insulator that is composed of an exceptional high-kfluorinated dielectric and an ion-gel-blend polymer matrix are reported. The structuring polymer is high-kpoly(vinylidenefluoride-trifluoroethylene-chlorotrifluoroethylene) (P(VDF-TrFE-CTFE)) terpolymer. The ion gel is made of poly(vinylidene fluoride-co-hexafluroropropylene) (P(VDF-HFP)) and 1-ethyl-3-methylimidazolium bis(trifluoromethylsulfonyl) imide ([EMIM][TFSI]) ion liquid. The blend polymer matrix has high measured capacitance of approximate to 2 to 5.5 mu F cm(-2)at 100 Hz, which is attributed to formation of electrical double layers (EDLs) at the insulator/semiconductor interface. High effective carrier mobility (mu(eff)) and low operating voltage <= 2 V with just 0.5 v% of P(VDF-HFP)-[EMIM][TFSI] solution in the bulk P(VDF-TrFE-CTFE) insulating layer are demonstrated, coupled with low gate-leakage current levels. Excellent mu(eff) = 1.30 +/- 0.19 cm(2)V(-1)s(-1)is achieved in P3HT FETs with SEGI, which is a remarkable boost from 0.48 +/- 0.09 cm(2)V(-1)s(-1)at 30 V when pure P(VDF-TrFE-CTFE) dielectric is used. Other semiconductors are also tested: IGZO has mu(eff) = 11.09 +/- 2.07 cm(2)V(-1)s(-1), and PDFDT has mu(eff) = 2.42 +/- 0.46 cm(2)V(-1)s(-1). These remarkable increases in mobility are attributed to the high concentration of induced carriers in the semiconducting channel.
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