Fabrication and Characterization of ZnO Nanorods on Multiple Substrates

Abstract

In this study, we present the fabrication and characterization of ZnO nanorods (N Rs) grown on p-Si, gold (Au) and nickel (Ni) coated on Si wafer, indium tin oxide (ITO), and quartz substrates. The aqueous chemical growth method is used for the vertical growth of ZnO NRs on multiple substrates. The samples are characterized with scanning electron microscope and energy dispersive X-ray spectroscopy to probe into the growth, alignment, density, diameter, and length of ZnO NRs on multiple substrates. It is found that under same conditions, like growth temperature, growth time, and solution concentration, ZnO NRs on ITO and quartz have same length but comparatively larger diameter than on other samples. The effects of growth time on the diameter and length of ZnO NRs are also explored. All the samples are characterized with probe station to look at the current voltage (I-V) behavior of ZnO NRs on multiple substrates. It is found that ZnO N Rs on p-Si show a simple p-n heterojunction diode like behavior. ZnO NRs grown on Au- and Ni-coated Si wafers show Schottky I-V characteristic behaviors while ZnO NRs on ITO show a simple ohmic I-V response with comparatively higher level of current. Finally, the I-V response of ZnO NRs on p-Si is also studied under ultraviolet illumination. Because of the photo-generated carriers in ZnO, the sample shows higher level of current upon illumination.