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Influence of annealing temperature on magnetic properties of InFeP prepared by ion implantation
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Zhou, L. | - |
| dc.contributor.author | Shang, Y. X. | - |
| dc.contributor.author | Yuldashev, Sh. U. | - |
| dc.contributor.author | Kwon, Y. H. | - |
| dc.contributor.author | Yang, W. C. | - |
| dc.contributor.author | Yan, S. J. | - |
| dc.contributor.author | Fu, D. J. | - |
| dc.contributor.author | Kang, T. W. | - |
| dc.date.accessioned | 2024-09-26T13:01:28Z | - |
| dc.date.available | 2024-09-26T13:01:28Z | - |
| dc.date.issued | 2013-08-15 | - |
| dc.identifier.issn | 0257-8972 | - |
| dc.identifier.issn | 1879-3347 | - |
| dc.identifier.uri | https://scholarworks.dongguk.edu/handle/sw.dongguk/25029 | - |
| dc.description.abstract | InFeP layers were prepared by implantation of 5 x 10(16) Fe+/cm(2) into InP wafers followed by thermal annealing at 300-600 degrees C. The samples were studied by atomic force microscopy, magnetic force microscopy, and superconducting quantum interference device, which showed the existence of magnetic clusters on surface of samples annealed at high temperatures and clear ferromagnetic behavior with a Curie temperature exceeding room temperature. High temperature annealing tends to degrade the magnetic properties. The ferromagnetism of the Fe-implanted InP samples is interpreted by double exchange of d-electrons in the impurity band and ferromagnetic clusters (InFe alloy, Fe or Fe3P). (C) 2012 Elsevier B.V. All rights reserved. | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | ELSEVIER SCIENCE SA | - |
| dc.title | Influence of annealing temperature on magnetic properties of InFeP prepared by ion implantation | - |
| dc.type | Article | - |
| dc.publisher.location | 스위스 | - |
| dc.identifier.doi | 10.1016/j.surfcoat.2012.05.139 | - |
| dc.identifier.scopusid | 2-s2.0-84879798152 | - |
| dc.identifier.wosid | 000323628400051 | - |
| dc.identifier.bibliographicCitation | SURFACE & COATINGS TECHNOLOGY, v.228, no.SUPPL.1, pp S233 - S236 | - |
| dc.citation.title | SURFACE & COATINGS TECHNOLOGY | - |
| dc.citation.volume | 228 | - |
| dc.citation.number | SUPPL.1 | - |
| dc.citation.startPage | S233 | - |
| dc.citation.endPage | S236 | - |
| dc.type.docType | Article; Proceedings Paper | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | sci | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.subject.keywordPlus | FE | - |
| dc.subject.keywordPlus | CENTERS | - |
| dc.subject.keywordAuthor | Ion implantation | - |
| dc.subject.keywordAuthor | Double exchange | - |
| dc.subject.keywordAuthor | Magnetic clusters | - |
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Related Researcher
- Yang, Woo Chul
- College of Natural Science (Department of Physics)